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| Name︰ | Quartz glass crucible for semiconductor industry |
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| specifications︰ | Typical sizes规格尺寸：
Crucible size坩埚尺寸 Qutside dia 外径D Height高度H Thickless厚度 R* r*
tl t2 t3
8″ 203±03 153±3 5．5±1．5 3 8.5 305 30
10″ 254±2 178±3 6．0±1．5 3.5 9 305 70
12″ 305±2 228±3 6．5±1．5 4 9.5 305 80
14″ 355±2 254±3 7．5±1．5 5 10.5 400 90
16″ 404±2 305±3 8．5±1．5 6 11.5 400 90
18″ 457±2 355±3 8．5±1．5 6 11.5 500 120
20″ 508±4 38l±3 10±3 6 11.0 500 120
22″ 558±4．5 381±3 10±3 7 11.0 558 89
24″ 610±4．5 381±3 11±2 7±l 11.0 610 89
*Approximate figures 近似值
DHS standard purity，solar grade 标准纯度
DHSA High putity，semiconductor grade 高纯度半导体级
DHSB Utmahigh putity，10W alkali，low aluminum，low boron，semiconductor grade
高纯度，低碱，低铝，低硼，半导体级
Quartz glass products of electric arc melting for fluorescent powder
彩色荧光粉用电弧法石英玻璃制品
规格尺寸available sizes and tolerances mm
产品名称 Name 外径
Outside dia 壁厚
Wall thickness 高度Height 底形
Botom
石英坩埚
Quartz glass crucible 90±1．5 5±1 110±2 园底Found 平底flat
130±2 6±1 160±2 ″ ″
141±2 6．5±0．5 160±2 ″ ″
145±2 6±1 150±2 ″ ″
180±3 6±1 270±3 ″ ″
石英盘
Quartz glass plate 280±2 7±1 110±2 ″
305±2 7±1 55±1 ″
325±1 8±1 105±1 ″
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| Advantages︰ | Semitransparent quartz glass crucible of arc melting used for semiconductor industry is the essentialbasic material for pulling monocrvstalline silicon and developing L S I Circuit． At present， the small transparent quartz crucibles have been replaced by this kind of crucibles in developed countries． It has The advantages of high purity，high temperature resistance， With big size，good thermal insulation，economization on energy，quality stability etc． In China only our company produced the crucible With imported equipment． The high pure graphite used in arc crucible of ourcompany is produced With introduced from Japan techniques， ash content less than 80 PPm， is the Unique in China．
Analysis of impurity 纯度的化学分析
Type型号 A1 Fe Ca Cu K Na Li B OH
DHS 20 l 1．5 O．1 3 3 3 O．3 30
DHS-A 15 O．3 O．6 O．05 0．7 1.0 0.7 <0.1 30
DHS-B 8 O．2 O．6 O．02 O．3 0.9 0.2 <0.05 30
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